Imec Installs ASML EXE:5200 High-NA EUV System in Leuven Facility

March 19, 2026
Imec has received the ASML EXE:5200 High-NA EUV lithography system, marking a key step toward developing sub-2nm chip technologies and advancing semiconductor research in its Leuven cleanroom.

Belgian semiconductor research center imec has received the ASML EXE:5200 High-NA EUV lithography system, announced in a press release. The installation marks the arrival of the world’s most advanced lithography equipment at imec’s 300mm cleanroom in Leuven.

Developed by ASML, the High-NA EUV tool features a numerical aperture of 0.55 and provides unmatched resolution and overlay performance. It is designed to support the development of sub-2nm logic and high-density memory technologies. The system is integrated with imec’s suite of patterning and metrology tools to enable research on next-generation semiconductor manufacturing processes.

Imec stated that the new lithography system will allow its ecosystem partners to accelerate chip scaling and performance improvements in areas such as advanced AI and high-performance computing. The installation follows earlier collaboration between imec and ASML at their joint High-NA EUV Lithography Lab in Veldhoven, the Netherlands.

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